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Publication : Error-prone, stress-induced 3' flap-based Okazaki fragment maturation supports cell survival.

First Author  Sun H Year  2021
Journal  Science Volume  374
Issue  6572 Pages  1252-1258
PubMed ID  34855483 Mgi Jnum  J:317224
Mgi Id  MGI:6834014 Doi  10.1126/science.abj1013
Citation  Sun H, et al. (2021) Error-prone, stress-induced 3' flap-based Okazaki fragment maturation supports cell survival. Science 374(6572):1252-1258
abstractText  How cells with DNA replication defects acquire mutations that allow them to escape apoptosis under environmental stress is a long-standing question. Here, we report that an error-prone Okazaki fragment maturation (OFM) pathway is activated at restrictive temperatures in rad27Delta yeast cells. Restrictive temperature stress activated Dun1, facilitating transformation of unprocessed 5' flaps into 3' flaps, which were removed by 3' nucleases, including DNA polymerase delta (Poldelta). However, at certain regions, 3' flaps formed secondary structures that facilitated 3' end extension rather than degradation, producing alternative duplications with short spacer sequences, such as pol3 internal tandem duplications. Consequently, little 5' flap was formed, suppressing rad27Delta-induced lethality at restrictive temperatures. We define a stress-induced, error-prone OFM pathway that generates mutations that counteract replication defects and drive cellular evolution and survival.
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